סמינר: Graduate Seminar

קהילת נשות הנדסת חשמל ומחשבים

Chemical Vapor Deposition (CVD) Growth of Monolayer MoS₂: Impact of Growth Promoters on Morphology and Electrical Performance

Date: September,15,2025 Start Time: 14:30 - 15:30
Location: אולם 1061, בניין מאייר
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Chemical Vapor Deposition (CVD) Growth of Monolayer MoS₂: Impact of Growth Promoters on Morphology and Electrical Performance
Two-dimensional (2D) materials, such as transition metal dichalcogenides (TMDs), have attracted significant attention for their potential in next-generation electronic and optoelectronic devices due to their atomically thin structure and unique electrical properties. Among them, monolayer MoS₂ stands out as a promising semiconductor for low-power field-effect transistors (FETs). In this work, we investigate the growth of monolayer MoS₂ using chemical vapor deposition (CVD) with MoO₃ and sulfur precursors. The effects of growth promoters, including NaCl and glass substrates, are systematically studied, revealing their influence on domain size, film continuity, and monolayer coverage. A reliable transfer method is implemented to integrate the MoS₂ films onto device-compatible substrates. Comprehensive characterization confirms high structural and optical quality, and FETs fabricated from the transferred MoS₂ exhibit promising electrical performance. These results provide valuable insights into the scalable growth–performance relationship and support the integration of CVD-grown MoS₂ into future low-power electronic platforms.

student Under the supervision of Dr. Assael Cohen.

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