Researchers at the Faculty have mastered an innovative material that may replace silicon in the world of electronics in the future. This development is essential in light of halting the miniaturization trend in the transistor and chip worlds. The study was recently published in the scientific journal Advanced Functional Materials.
Prof. Lior Kornblum explains, “Due to constant miniaturization, transistors the size of a few dozen atoms are now being produced. At these dimensions, it is increasingly difficult to continue miniaturization without compromising the performance of transistors and the chips that contain them. At nanoscale scales, transistors behave in new ways, different from their larger ancestors, thereby impairing the proper functioning of the processor.”
Doctoral student Lishi Shoham is engaged in her research in both fields together. She studies the material’s properties and makes a transistor from it to examine how it can be harnessed for microelectronics. In the current study, Shoham led a team that included another 12 researchers from eight research institutions and companies in Switzerland, Japan, France, and the United States.
According to Prof. Kornblum, “We are very privileged to develop these capabilities here in Israel, to work with brilliant students, and to collaborate with leading scientists worldwide who have contributed to this research. We are reaping the benefits of the excellent scientific infrastructure that the Technion is constantly developing and perfecting and of our excellent students.”
The study was conducted at the Sarah and Moshe Zisapel Center for Nanoelectronics with funding from the Israel Science Foundation and was supported by the Russell Berrie Institute for Nanotechnology and the Nancy and Stephen Grand Energy Program.
For the full article in Advanced Functional Materials click here
