Seminar: Graduate Seminar
Chemical Vapor Deposition (CVD) Growth of Monolayer MoSโ: Impact of Growth Promoters on Morphology and Electrical Performance
Date:
September,15,2025
Start Time:
14:30 - 15:30
Location:
1061, Meyer Building
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Lecturer:
Luai Taha
Research Areas:
| Chemical Vapor Deposition (CVD) Growth of Monolayer MoSโ: Impact of Growth Promoters on Morphology and Electrical Performance |
| Two-dimensional (2D) materials, such as transition metal dichalcogenides (TMDs), have attracted significant attention for their potential in next-generation electronic and optoelectronic devices due to their atomically thin structure and unique electrical properties. Among them, monolayer MoSโ stands out as a promising semiconductor for low-power field-effect transistors (FETs). In this work, we investigate the growth of monolayer MoSโ using chemical vapor deposition (CVD) with MoOโ and sulfur precursors. The effects of growth promoters, including NaCl and glass substrates, are systematically studied, revealing their influence on domain size, film continuity, and monolayer coverage. A reliable transfer method is implemented to integrate the MoSโ films onto device-compatible substrates. Comprehensive characterization confirms high structural and optical quality, and FETs fabricated from the transferred MoSโ exhibit promising electrical performance. These results provide valuable insights into the scalable growthโperformance relationship and support the integration of CVD-grown MoSโ into future low-power electronic platforms.
student Under the supervision of Dr. Assael Cohen. |